金属表面场致发射的M-F模型
Field emission from metal surfaces in the Thomas-Fermi-von-Weizsäcker model
摘要：
本文在费米子近似下计算了结皮金属表面的电子发射电流密度。我们实现了加权密度近似（WDA）的相互作用电子的交换和相关能的描述。我们发现，发射机制表现出从量子跨越到经典的电子从表面的势垒逃逸。远低于表面特定的阈值场强$E_d$，电子隧穿主要受金属功函数变化的影响，并且对表面势垒的详细形状不太敏感。特别是，由于离开表面的电子的图像电荷平面的位置不精确地与响应于所施加的电场的表面处的感应屏蔽电荷的质心重合，我们发现金属功函数有效地增加了$ΔW \sim 0.01$ eV，这降低了暗电流。
英文摘要：
We evaluate the electron emission current density from jellium metallic surfaces in the Thomas-Fermi-von-Weizsäcker approximation. We implement the weighted density approximation (WDA) for description of the exchange and correlation energy of interacting electrons. We find the emission mechanism exhibits crossover from quantum to classical over-barrier escape of electrons from the surface. Well below a surface-specific threshold field strength $E_d$, electron tunneling is mainly affected by the change of the metal workfunction, and is less sensitive to the detailed shape of the surface barrier. In particular, since the position of the image charge plane for electrons leaving the surface does not precisely coincide with the centroid of the induced screening charge at the surface in response to the applied electric field, we find an effective increase in the metal workfunction by $ΔW \sim 0.01$ eV, which decreases the dark current.
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