Laser辅助碳纳米管生长的动力学
Kinetics of Laser-Assisted Carbon Nanotube Growth
摘要：
激光辅助化学气相沉积（CVD）生长是一种有吸引力的无掩模工艺，用于在温度敏感衬底上的选定位置生长局部对齐的碳纳米管（CNT）。局部化过程的性质导致碳纳米管的快速生长，具有高的实验吞吐量。在这里，我们报告有关的物理和化学过程特性的生长动力学的详细调查。具体而言，生长动力学的研究通过监测生长过程中反射激光束强度的动态变化。受益于快速生长和高实验通量，我们调查了广泛的实验条件，并提出了几种生长制度。速率限制步骤确定使用速率方程链接到建议的生长制度，其特征在于进一步通过拉曼光谱和扫描电子显微镜（SEM），因此直接连接生长制度的碳纳米管的结构质量。不同制度的活化能被发现在0.3 - 0.8 eV的范围内。
英文摘要：
Laser-assisted chemical vapour deposition (CVD) growth is an attractive mask-less process for growing locally aligned carbon nanotubes (CNTs) in selected places on temperature sensitive substrates. The nature of the localized process results in fast carbon nanotube growth with high experimental throughput. Here, we report on detailed investigation of growth kinetics related to physical and chemical process characteristics. Specifically, the growth kinetics is investigated by monitoring the dynamical changes of reflected laser beam intensity during growth. Benefiting from the fast growth and high experimental throughput, we investigate a wide range of experimental conditions and propose several growth regimes. Rate-limiting steps are determined using rate equations linked to the proposed growth regimes, which are further characterized by Raman spectroscopy and Scanning Electron Microscopy (SEM), therefore directly linking growth regimes to the structural quality of the CNTs. Activation energies for the different regimes are found in the range of 0.3 - 0.8 eV.
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