二维电子气中的相敏双色光电阻
Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas
摘要：
本文用量子动力学方程研究了二维电子系统在两种辐射场（频率为$ω_1$和$ω_2$）作用下的微波光阻效应。我们已经发现，当$ω_2/ω_1= 1 + 2/N$，其中$N$是一个整数，和两个波具有相同的偏振，位移机制产生一个新的，相敏的光电阻。这种光电阻随磁场振荡，并且在典型的实验条件下可以是总光电阻的很好的一部分。另一方面，如果辐射场是圆偏振的，则非弹性机制给出零相敏光阻。
英文摘要：
We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies $ω_1$ and $ω_2$) using quantum kinetic equation. We have found that when $ω_2/ω_1= 1 + 2/N$, where $N$ is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.
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