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arXiv 1210.8232cond-mat.mtrl-sci
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砷化镓损伤团簇电子结构的模拟与建模

Simulation and modeling of the electronic structure of GaAs damage clusters

Jonathan E. Moussa, Stephen M. Foiles, Peter A. Schultz

AI总结:

本研究通过分子动力学与密度泛函理论模拟研究GaAs辐射损伤团簇的电子特性,发现其可用半导体球带电模型描述,高损伤下带隙闭合形成金属,费米能级比价带顶高0.46±0.07 eV。

摘要:

为给砷化镓(GaAs)辐射损伤模型构建更坚实的微观基础,本研究采用原子模拟方法探究了辐射诱导损伤团簇的电子特性。研究运用分子动力学模拟获取碰撞级联直接模拟所需的时间与长度尺度,并通过密度泛函理论模拟计算从这些级联中提取的孤立损伤团簇的电子特性。为研究团簇的物理特性,我们分析了随机生成的损伤团簇系综的统计特征,因为单个团簇无法充分代表这类缺陷。损伤团簇的电子特性可通过嵌入均匀电介质的半导体球带电经典模型精确描述。团簇的有效带隙取决于内部结构损伤程度,在高损伤极限下带隙闭合形成金属。我们估算出对应于高能非晶GaAs的这种金属态的费米能级,比晶体GaAs的价带顶高0.46±0.07 eV。

英文摘要:

In an effort to build a stronger microscopic foundation for radiation damage models in gallium arsenide (GaAs), the electronic properties of radiation-induced damage clusters are studied with atomistic simulations. Molecular dynamics simulations are used to access the time and length scales required for direct simulation of a collision cascade, and density functional theory simulations are used to calculate the electronic properties of isolated damaged clusters that are extracted from these cascades. To study the physical properties of clusters, we analyze the statistics of a randomly-generated ensemble of damage clusters because no single cluster adequately represents this class of defects. The electronic properties of damage clusters are accurately described by a classical model of the electrical charging of a semiconducting sphere embedded in an uniform dielectric. The effective band gap of the cluster depends on the degree of internal structural damage, and the gap closes to form a metal in the high-damage limit. We estimate the Fermi level of this metallic state, which corresponds to high-energy amorphous GaAs, to be 0.46 +/- 0.07 eV above the valence band edge of crystalline GaAs.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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