高度a轴取向AlN薄膜的光学性能和硬度
Optical properties and hardness of highly a-axis oriented AlN films
摘要：
本文首次报道了研究较少的高度a轴取向AlN薄膜的光学和纳米力学性能。这些薄膜是通过反应直流磁控溅射技术沉积在一个最佳的目标基板的距离为180 mm。布拉格-布伦塔诺几何X射线和摇摆曲线（FWHM = 52 arcsec）的研究证实了优先取向。椭圆偏振光谱表明，这些薄膜在546 nm的波长下表现出1.93的折射率。这些薄膜的硬度和弹性模量分别为17 GPa和190 GPa。这里获得的机械性能比以前报道的高得多，因此可以用作热敏印刷设备中的保护涂层，体声波谐振器中的压电膜。
英文摘要：
This paper reports optical and nanomechanical properties of seldom studied highly a-axis oriented AlN thin films for the first time. These films were deposited by reactive DC magnetron sputtering technique at an optimal target to substrate distance of 180 mm. Bragg-Brentano geometry X-ray and rocking curve (FWHM = 52 arcsec) studies confirmed the preferred orientation. Spectroscopic ellipsometry revealed that these films exhibit a refractive index of 1.93 at a wavelength of 546 nm. The hardness and elastic modulus of these films were 17 GPa and 190 GPa, respectively. The mechanical properties obtained here are much higher than the earlier reported and therefore can be useful as protective coating in thermo printing devices, piezoelectric films in bulk acoustic wave resonators.
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