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arXiv 1204.5573astro-ph.CO
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对数晕质量密度的二阶偏差模型

A Second-order bias model for the Logarithmic Halo Mass Density

Inh Jee, Changbom Park, Juhan Kim, Yun-Young Choi, Sungsoo S. Kim

摘要:

我们提出了一个LCDM宇宙中暗物质晕局部偏差的解析模型。该模型使用晕质量密度而不是晕数密度,并搜索各种晕质量切割,平滑长度和红移时期。我们发现,当使用对数密度时,二阶多项式可以非常好地拟合晕质量分布与下伏物质分布之间的数值关系。在这个模型中,暗物质密度的对数用晕质量密度的对数展开到二阶。该模型对于所有晕质量切割(从M_{cut} =3 \times 10^{11} $ to $ 3 \times 10^{12}h^{-1} M_{\odot} $), smoothing scales (from $ R= 5 h ^{-1} $Mpc to $ 50 h ^{-1}$Mpc)和本研究中考虑的红移范围(从z=0到1.0)仍然是极好的。发现该关系式中的随机项并不完全随机,但其中一部分可以由剪切张量的大小决定。

英文摘要:

We present an analytic model for the local bias of dark matter halos in a LCDM universe. The model uses the halo mass density instead of the halo number density and is searched for various halo mass cuts, smoothing lengths, and redshift epoches. We find that, when the logarithmic density is used, the second-order polynomial can fit the numerical relation between the halo mass distribution and the underlying matter distribution extremely well. In this model the logarithm of the dark matter density is expanded in terms of log halo mass density to the second order. The model remains excellent for all halo mass cuts (from M_{cut}=3\times10^{11}$ to $3\times10^{12}h^{-1}M_{\odot}$), smoothing scales (from $R=5h^{-1}$Mpc to $50h^{-1}$Mpc), and redshift ranges (from z=0 to 1.0) considered in this study. The stochastic term in the relation is found not entirely random, but a part of the term can be determined by the magnitude of the shear tensor.

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