XUV中成像板系统的灵敏度（60 eV < E < 900 eV）
Sensitivity of an image plate system in the XUV (60 eV < E < 900 eV)
摘要：
荧光成像板（IP）已被校准，并证明可用于定量X射线成像在1至超过1000 keV的能量范围。在本文中，我们报告的校准测量XUV能量在60至900 eV的能量范围内使用光束线6.3.2在劳伦斯伯克利国家实验室的先进光源。我们在规定的能量范围内测量了~25 ± 15计数/pJ的灵敏度，这与用于时间分辨测量的Si光电二极管的灵敏度兼容。我们在900 eV的测量结果与Meadowcroft等人在~1 keV的测量结果一致。
英文摘要：
Phosphor imaging plates (IPs) have been calibrated and proven useful for quantitative x-ray imaging in the 1 to over 1000 keV energy range. In this paper we report on calibration measurements made at XUV energies in the 60 to 900 eV energy range using beamline 6.3.2 at the Advanced Light Source at Lawrence Berkeley National Laboratory. We measured a sensitivity of ~25 plus or minus 15 counts/pJ over the stated energy range which is compatible with the sensitivity of Si photodiodes that are used for time-resolved measurements. Our measurements at 900 eV are consistent with the measurements made by Meadowcroft et al. at ~1 keV.
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