电离波在微腔等离子体阵列上的传播
Ionization wave propagation on a micro cavity plasma array
摘要：
在p-Si基片上制备了倒金字塔腔微腔等离子体阵列。每个空腔都充当微观介质阻挡放电。在大气压下在氩气中工作，并在约10 kHz的高电压下激发，每个腔体都会产生局部微等离子体。实验表明，单个腔体之间存在强相互作用，导致波状光发射结构沿阵列表面传播。这一现象的数值研究，使用计算机模拟。观测到的电离波传播速度约为5 km/s，这与实验结果吻合得很好。据发现，波的传播是由于连续的贡献的漂移的电子，然后由相邻腔中的等离子体的电子的光致发射种子的腔之间的离子的漂移。
英文摘要：
Microcavity plasma arrays of inverse pyramidal cavities have been fabricated in p-Si wafers. Each cavity acts as a microscopic dielectric barrier discharge. Operated at atmospheric pressure in argon and excited with high voltage at about 10 kHz, each cavity develops a localized microplasma. Experiments have shown a strong interaction of individual cavities, leading to the propagation of wave-like optical emission structures along the surface of the array. This phenomenon is numerically investigated using computer simulation. The observed ionization wave propagates with a speed of about 5 km/s, which agrees well the experimental findings. It is found that the wave propagation is due to sequential contributions of a drift of electrons followed by drift of ions between cavities seeded by photoemission of electrons by the plasma in adjacent cavities.
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