掠入射和斜入射离子溅射制备ZnO薄膜的波纹形貌
Ripple topography on thin ZnO films by grazing and oblique incidence ion sputtering
摘要：
研究了10 keV氧离子轰击ZnO薄膜时纳米尺度波纹形貌的形成和生长，轰击角度为80 ° { \degree }和60 ° { \degree }，离子注量从5 × 10 ^16到1{ \times } 10 ^18 ions/cm 2变化。在800处，波纹沿着离子束方向定向，而在600处，波纹垂直于离子束方向。利用原子力显微镜（AFM）对所研制的离子诱导结构进行了表征，并结合现有的离子表面相互作用模型和基本概念，讨论了离子诱导结构的取向、均方根粗糙度、波长和相关长度的变化。
英文摘要：
We have investigated the formation and growth of nano sized ripple topography on ZnO thin films by 10 keV O1+ bombardment at impact angles of 80{\degree} and 60{\degree}, varying the ion fluence from 5{times}10^16 to 1{\times}10^18 ions/cm2. At 800 the ripples are oriented along the ion beam direction whereas at 600 it is perpendicular to the ion beam direction. The developed ion induced structures are characterized by Atomic Force Microscopy (AFM) and the alignment, variation of rms roughness, wavelength and correlation length of the structures are discussed with the existing model and basic concept of ion surface interaction.
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