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arXiv 1102.1945cond-mat.mes-hallcond-mat.mtrl-sci
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使用压印固体电解质印模的直接金属纳米压印

Direct metal nano-imprinting using embossed solid electrolyte stamp

A Kumar, K H Hsu, K E Jacobs, P M Ferreira, N X Fang

摘要:

在本文中,我们报告了直接图案化的金属纳米结构使用浮雕固体电化学邮票。微成型固体超离子邮票使用硅模板-类似于聚合物图案的纳米压印光刻-进行了探讨。硫化银(Ag 2S)-一种具有优异微成形性能的超离子导体-作为候选材料进行了研究。研究了超离子压模的重要参数,包括机械性能、成形过程中的材料流动和压印后的特征恢复。观察到在压印以及蚀刻期间优异的特征转移性。为了说明这种方法的能力,还展示了具有6 mm间隙的银纳米天线<10 nm were successfully fabricated. The possibility for large area patterning with stamp diameters >。基于压印的金属图案化允许制造超过二维纳米织物和几个图案化方案的报告。

英文摘要:

In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates-analogous to polymer patterning in nano-imprint lithography-is explored. Silver sulfide (Ag2S)-a superionic conductor with excellent micro-forming properties-is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming, and feature recovery after embossing are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps <10 nm were successfully fabricated. The possibility for large area patterning with stamp diameters >6 mm is also demonstrated. Embossing based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported.

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