在正方形晶格上无规沉积棒状颗粒生长薄膜
Thin-film growth by random deposition of rod-like particles on a square lattice
摘要：
采用蒙特卡罗模拟在一维和二维上研究了由不同尺寸的颗粒沉积在衬底上所产生的表面生长。粒子具有线性形式，并且占据晶格的整数个单元。我们的模拟结果表明，随着时间的推移，粗糙度演变以下三种不同的行为。初始时间的粗糙度表现为随机沉积模型中的粗糙度，具有指数$β_{1} \approx 1/2$。在中间时间，表面粗糙度取决于系统维数，最后，在长时间，它进入饱和状态，这是由粗糙度指数$α$描述。模型的标度指数与一维沉积的Villain-Lai-Das Sarma方程预测的标度指数相同。对于在两个维度的沉积，我们表明，在第二政权的界面宽度提出了一个不寻常的行为，由增长指数$β_{2}$，这取决于添加到衬底的颗粒的大小描述。如果颗粒的线性尺寸是2，我们发现对于所有大于3的颗粒尺寸，$β_{2}<β_{1}$，否则它是$β_{2}>β_{1}$。在一维中，标度指数与Villain-Lai-Das Sarma方程预测的相同，而在二维中，增长指数是非普适的。
英文摘要：
Monte Carlo simulations are employed to investigate the surface growth generated by deposition of particles of different sizes on a substrate, in one and two dimensions. The particles have a linear form, and occupy an integer number of cells of the lattice. The results of our simulations have shown that the roughness evolves in time following three different behaviors. The roughness in the initial times behaves as in the random deposition model, with an exponent $β_{1} \approx 1/2$. At intermediate times, the surface roughness depends on the system dimensionality and, finally, at long times, it enters into the saturation regime, which is described by the roughness exponent $α$. The scaling exponents of the model are the same as those predicted by the Villain-Lai-Das Sarma equation for deposition in one dimension. For the deposition in two dimensions, we show that the interface width in the second regime presents an unusual behavior, described by a growing exponent $β_{2}$, which depends on the size of the particles added to the substrate. If the linear size of the particle is two, we found that $β_{2}<β_{1}$, otherwise it is $β_{2}>β_{1}$, for all particles sizes larger than three. While in one dimension the scaling exponents are the same as those predicted by the Villain-Lai-Das Sarma equation, in two dimensions, the growth exponents are nonuniversal.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
