arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1008.4124cond-mat.mtrl-scicond-mat.otherquant-ph
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极化设计的GaN/InGaN/GaN隧道二极管

Polarization-engineered GaN/InGaN/GaN tunnel diodes

Sriram Krishnamoorthy, Digbijoy N. Nath, Fatih Akyol, Pil Sung Park, Michele Esposto, Siddharth Rajan

摘要:

我们报告的设计和演示的极化工程GAN/InGaN/GAN隧道结二极管具有高电流密度和低隧道导通电压。WKB计算被用于建模和设计具有窄带隙InGaN基势垒层的隧道结。采用分子束外延技术生长了N极性p-GaN/In 0. 33 Ga 0. 67 N/n-GaN异质结隧道二极管。在1V的反向偏压下获得了118 A/cm ~ 2的高电流密度,最大电流密度达到9.2kA/cm ~ 2。这些结果代表了III族氮化物隧道结中报道的最高电流密度,并证明了III族氮化物隧道器件在广泛的光电和电子应用中的潜力。

英文摘要:

We report on the design and demonstration of polarization-engineered GaN/InGaN/GaN tunnel junction diodes with high current density and low tunneling turn-on voltage. Wentzel-Kramers-Brillouin (WKB) calculations were used to model and design tunnel junctions with narrow bandgap InGaN-based barrier layers. N-polar p-GaN/In0.33Ga0.67N/n-GaN heterostructure tunnel diodes were grown using molecular beam epitaxy. Efficient zero bias tunneling turn-on with a high current density of 118 A/cm2 at a reverse bias of 1V, reaching a maximum current density up to 9.2 kA/cm2 were obtained. These results represent the highest current density reported in III-nitride tunnel junctions, and demonstrate the potential of III-nitride tunnel devices for a broad range of optoelectronic and electronic applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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