射弹质量、反应性和分子对离子纳米结构的依赖性
Projectile's mass, reactivity and molecular dependence on ion nanostructuring
摘要：
本文报道了8 keV的He ~（1+）、N ~（1+）、O ~（1+）、Ar ~（1+）原子离子和16 keV的N ~（21+）、O ~（21+）分子离子以60 °入射角轰击Si（100）表面时，离子束质量、化学反应性和非线性效应对离子束诱导纳米结构形成的影响。非原位原子力显微镜（AFM）测量揭示了各种形式和尺寸取决于弹丸质量，化学反应性和分子状态的波纹结构的发展。本实验研究探讨了离子诱导纳米图案化的必要条件及其控制。
英文摘要：
We have reported the dependence of projectile mass along with the chemical reactivity and nonlinear effects on ion beam induced nano structure formation when 8 keV He1+, N1+, O1+, Ar1+ atomic ions and 16 keV N21+ and O21+ molecular ions are bombarded on the Si (100) surface at an incidence angle of 600. Ex situ atomic force microcopy (AFM) measurements reveals the ripple structure development of various forms and dimensions depending on the projectiles mass, chemical reactivity and molecular state. This experimental study explores the necessary requirements for ion induced nanopatterning and their control.
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