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arXiv 1004.0813cond-mat.mtrl-sci
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在化学不均匀基底上使用二嵌段共聚物膜的纳米光刻模板

Nanolithographic templates using diblock copolymer films on chemically heterogeneous substrates

Vassilios Kapaklis, Spyridon Grammatikopoulos, Roman Sordan, Alessio Miranda, Floriano Traversi, Hans von Känel, Dimitrios Trachylis, Panagiotis Poulopoulos, Constantin Politis

摘要:

对称二嵌段共聚物薄膜的相分离形成的层状结构的取向强烈地受到聚合物嵌段相对于基底的润湿性质的影响。在裸硅晶片上,聚苯乙烯-b-聚甲基丙烯酸甲酯薄膜的片层倾向于平行于晶片表面排列,聚甲基丙烯酸甲酯块优先润湿硅。我们已经开发了一种方法,用于通过使用化学改性的基板诱导laminates垂直于基板的安排。这是通过在沉积在硅片上的薄金膜上化学吸附硫醇封端的烷烃链的自组装单层来实现的。我们还表明,它是可能的,以空间控制垂直方向的薄片在亚微米的长度尺度,通过使用简单的化学图案和蚀刻它们,以产生纳米光刻模板。该方法对于使用嵌段共聚物薄膜制备明确的模板可能具有很大的技术兴趣。

英文摘要:

The orientation of the lamellae formed by the phase separation of symmetric diblock copolymer thin films is strongly affected by the wetting properties of the polymer blocks with respect to the substrate. On bare silicon wafers the lamellae of polystyrene-b-polymethylmethacrylate thin films tend to order parallel to the wafer surface, with the polymethylmethacrylate block preferentially wetting silicon. We have developed a methodology for inducing the arrangement of lamellae perpendicular to the substrate by using chemically modified substrates. This is done by chemisorbing a self-assembled monolayer of thiol-terminated alkane chains on thin gold films deposited on silicon wafers. We also show that it is possible to spatially control the perpendicular orientation of the lamellae at sub-micron length scales by using simple chemical patterns and etch them, in order to produce nanolithographic templates. This method may be of great technological interest for the preparation of well-defined templates using block copolymer thin films.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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