Sn粒子与EUV光刻钌反射镜的掠入射相互作用
Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors
摘要：
用于22nm IC大批量生产的新EUV光刻工具使用λ= 13.5nm的EUV辐射。高功率激光（LPP）和放电（DPP）EUV光源基于Sn等离子体，用于将电功率最佳转换为带内辐射。锡燃料源发射碎片，如锡粒子在一个相当宽的能谱：从热化锡到几十keV的快离子。锡与面向高功率EUV光源的收集器反射镜表面的相互作用导致光刻工具的光学性能和生产率的劣化，因此必须抑制碎片，并且必须从理论和实验两方面仔细研究粒子照射期间反射镜材料的表面改性。对于DPP Sn燃料源，收集器是掠入射反射镜，其反射掠射角范围为约1 \degree至20 \degree的EUV光。这些收集镜最常用的材料是Ru。Sn粒子在不同的能量和角度与Ru镜的相互作用过程的知识是至关重要的，以了解镜退化和调整的源和碎片抑制装置的参数，以达到最佳的镜寿命。我们进行了研究的改性的钌表面暴露于同时通量的热化和高能锡在掠入射，能量从300 eV到30 keV。计算研究是用基于二体碰撞近似假设的蒙特卡罗程序TRIDYN和TRIM.SP进行的。这些工具允许动态地和在稳定状态下的表面组成的演变，并模拟表面结合能和密度，用于预测溅射，反射，离子辅助沉积和深度分布在纳米表面区域。
英文摘要：
The new EUV Lithography tools for IC High Volume Manufacture at 22nm make use of EUV radiation at λ= 13.5nm. High power Laser (LPP) and Discharge (DPP)EUV light sources are based on Sn plasmas for the optimum conversion of electrical power to in-band radiation. Sn-fueled sources emit debris such as Sn particles in a rather wide energy spectrum: from thermalized Sn to several tens keV fast ions. Tin interaction with the collector mirrors surfaces facing the high power EUV light source leads to the degradation of the optical performance and productivity of the litho tool, therefore debris must be suppressed and the surface modification of the mirror materials during the particle irradiation must be carefully investigated both theoretically and experimentally. For DPP Sn-fueled sources the collector is a grazing incidence mirror that reflects the EUV light in the grazing angle range from about 1\degree to 20\degree. The most used material for these collector mirrors is Ru. The knowledge of the interaction process of Sn particles at different energies and angles with Ru mirrors is crucial to understand mirror degradation and to tune the parameters of the source and of the debris suppression devices to reach optimal mirror lifetime. We carried out a study of the modification of the ruthenium surface exposed to the simultaneous flux of thermalized and energetic Sn at grazing incidence, for energies varying from 300eV to 30keV. The computational study is performed with the Monte Carlo codes TRIDYN and TRIM.SP based on binary collision approximation assumptions. These tools allow to follow dynamically and at steady state the evolution of the surface composition and to model surface binding energy and density for predicting sputtering, reflection, ion-assisted deposition and depth profiles in the nm surface region.
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