用原子力显微镜原位直接观察未处理抗蚀剂上的电子束辐照图案
In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy
摘要：
介绍了一种用于电子束光刻的抗蚀剂的原位表征方法。该技术是基于原子力显微镜的应用，它直接安装在电子束光刻系统的阴极下方。我们证明，由电子束照射的图案可以有效地可视化和分析后，直接在电子束曝光的表面形貌。这种原位分析在没有任何显影或烘烤步骤的情况下进行，并且提供了对被照射的抗蚀剂的化学（或潜）图像的访问。
英文摘要：
We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography system. We demonstrate that patterns irradiated by the e-beam can be efficiently visualized and analyzed in surface topography directly after the e-beam exposure. This in-situ analysis takes place without any development or baking steps, and gives access to the chemical (or latent) image of the irradiated resist.
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