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arXiv 0912.4446cond-mat.supr-con
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扩散正常金属-超导体隧道结的电子冷却

Electron cooling by diffusive normal metal - superconductor tunnel junctions

A. S. Vasenko, E. V. Bezuglyi, H. Courtois, F. W. J. Hekking

摘要:

本文研究了扩散极限下NN'IS隧道结中的热输运和电荷输运。这里N和S是大质量的正常和超导电极(储存器),N'是正常的金属条,I是绝缘体。这种结构中的电流在亚带隙偏压下的流动伴随着从普通金属到超导体的热传递,这使得普通金属中的电子能够制冷。我们表明,由于Andreev反射的两粒子电流产生焦耳加热,这是沉积在N电极和占主导地位的单粒子冷却在足够低的温度。这导致存在用于制冷的极限温度。我们考虑不同的几何形状的接触:一维和平面,这是常用的实验。我们还讨论了我们的结果的适用性,双势垒SINIS微冷却器。

英文摘要:

We investigate heat and charge transport in NN'IS tunnel junctions in the diffusive limit. Here N and S are massive normal and superconducting electrodes (reservoirs), N' is a normal metal strip, and I is an insulator. The flow of electric current in such structures at subgap bias is accompanied by heat transfer from the normal metal into the superconductor, which enables refrigeration of electrons in the normal metal. We show that the two-particle current due to Andreev reflection generates Joule heating, which is deposited in the N electrode and dominates over the single-particle cooling at low enough temperatures. This results in the existence of a limiting temperature for refrigeration. We consider different geometries of the contact: one-dimensional and planar, which is commonly used in the experiments. We also discuss the applicability of our results to a double-barrier SINIS microcooler.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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