CaF2、BaF2和Al2O3介电常数的温度依赖性：应用于预测与温度相关的作用于相邻Cs（8 P {3/2}）原子的范德华表面相互作用
Temperature dependence of the dielectric permittivity of CaF2, BaF2 and Al2O3: application to the prediction of a temperature dependent van der Waals surface interaction exerted onto a neighbouring Cs (8P{3/2}) atom
摘要：
通过反射率测量研究了CaF_2、BaF_2和Al_2 O_3在红外范围内介电常数在22 \degree C至500 \degree C范围内的温度行为。的介电常数检索通过拟合反射率谱与模型考虑到多声子的贡献。从测量结果外推的应用预测温度依赖的原子表面范德华相互作用。我们特别考虑作为感兴趣的原子的Cs（8 P3/2），其中最相关的虚拟耦合，落在热辐射的范围内，并位于附近的剩余辐射带的氟化物材料。
英文摘要：
The temperature behaviour in the range 22\degree C to 500\degree C of the dielectric permittivity in the infrared range is investigated for CaF2, BaF2 and Al2O3 through reflectivity measurements. The dielectric permittivity is retrieved by fitting reflectivity spectra with a model taking into account multiphonon contributions. The results extrapolated from the measurements are applied to predict a temperature-dependent atom-surface van der Waals interaction. We specifically consider as the atom of interest Cs (8P3/2), the most relevant virtual couplings of which, fall in the range of thermal radiation and are located in the vicinity of the reststrahlen band of fluoride materials.
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