缓冲电解抛光--粒子加速器用铌SRF腔极光滑表面的新方法
Buffered Electropolishing -- a New Way for Achieving Extremely Smooth Surface Finish on Nb SRF Cavities To be Used in Particle Accelerators
摘要:
JLab开发了一种新的铌(Nb)超导射频(SRF)腔体表面处理技术,称为缓冲电解抛光(BEP)。结果发现,BEP可以产生最光滑的表面光洁度的铌样品上的文献报道。实验结果表明,BEP的Nb去除率可以达到高达4.09 μ m/min。这是显着快1比传统的电解抛光技术采用的HF和H2SO 4的酸性混合物。一项调查正在进行中,以确定所有相关的BEP参数的最佳值,以便在椭圆形RF腔的几何形状内实现样品上实现的高质量表面光洁度。为此,在CEA-Saclay和JLAB都使用BEP电解液对单电池Nb腔进行电解抛光。将对这些腔体进行射频测试,并通过本演示文稿报告测试结果。
英文摘要:
A new surface treatment technique for niobium (Nb) Superconducting Radio Frequency (SRF) cavities called Buffered Electropolishing (BEP) has been developed at JLab. It was found that BEP could produce the smoothest surface finish on Nb samples ever reported in the literature. Experimental results revealed that the Nb removal rate of BEP could reach as high as 4.09 um/min. This is significantly faster1 than that of the conventional electropolishing technique employing an acid mixture of HF and H2SO4. An investigation is underway to determine the optimum values for all relevant BEP parameters so that the high quality of surface finish achieved on samples can be realized within the geometry of an elliptical RF cavity. Toward this end, single cell Nb cavities are being electropolished with BEP electrolyte at both CEA-Saclay and JLAB. These cavities will be RF tested and the results will be reported through this presentation.
机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。