arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 0903.3858cond-mat.supr-concond-mat.mtrl-sci
收藏

通过SiCl4掺杂提高MgB2的电场Jc

Enhancement of the in-field Jc of MgB2 via SiCl4 doping

Xiao-Lin Wang, S. X. Dou, M. S. A. Hossain, Z. X. Cheng, X. Z. Liao, S. R. Ghorbani, Q. W. Yao, J. H. Kim, T. Silver

摘要:

1)引入了一种新的硅源--液态SiCl_4(不含C),在临界温度几乎没有降低的情况下,显著提高了不可逆场(Hirr)、上临界场(Hc_2)和临界电流密度(Jc)。2)虽然Si不能并入晶格,但我们发现a轴晶格参数的减小与碳掺杂的程度相同。3)SiCl_4处理的MgB_2在20 K以上表现出比未处理的MgB_2和掺杂不同碳源的MgB_2更高的J_c和更好的场依赖性。3)我们提供了一个替代的解释减少的晶格参数在C和非C掺杂的MgB 2。4)。我们引入了一个新的参数RHH(Hc 2/Hirr),它可以清楚地反映磁通钉扎增强的程度,为进一步提高Jc提供了指导。5)我们已经发现,在载流子的平均自由程的空间变化是负责磁通钉扎机制在SiCl 4处理的MgB 2与大的内场Jc。

英文摘要:

In this work, we present the following important results: 1) We introduce a new Si source, liquid SiCl4, which is free of C, to significantly enhance the irreversibility field (Hirr), the upper critical field (Hc2), and the critical current density (Jc), with little reduction in the critical temperature (Tc). 2) Although Si can not incorporate into the crystal lattice, we found a reduction in the a-axis lattice parameter, to the same extent as for carbon doping. 3) The SiCl4 treated MgB2 shows much higher Jc with superior field dependence above 20 K than undoepd MgB2 and MgB2 doped with various carbon sources. 3) We provide an alternative interpretation for the reduction of the a lattice parameter in C- and non-C doped MgB2. 4). We introduce a new parameter, RHH (Hc2/Hirr), which can clearly reflect the degree of flux pinning enhancement, providing us with guidance for further enhancing Jc. 5) We have found that spatial variation in the charge carrier mean free path is responsible for the flux pinning mechanism in the SiCl4 treated MgB2 with large in-field Jc.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑