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arXiv 0902.2618cond-mat.stat-mech
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Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault, Christophe Josserand, Jean-Marc Bauchire, Amael Caillard, Christine Charles, Rod W. Boswell

英文摘要:

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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