固态量子比特中门错误的随机基准测试和过程层析成像
Randomized benchmarking and process tomography for gate errors in a solid-state qubit
摘要：
我们提出了测量单量子比特的超导量子比特门误差。从量子过程断层扫描和随机基准的结果进行比较，从双π脉冲实验获得的门误差。随机基准测试揭示了1.1+/-0.3%的最小平均门误差和保真度对门数量的简单指数依赖。它表明，门保真度的限制主要是由量子比特退相干，与理论一致。
英文摘要：
We present measurements of single-qubit gate errors for a superconducting qubit. Results from quantum process tomography and randomized benchmarking are compared with gate errors obtained from a double pi pulse experiment. Randomized benchmarking reveals a minimum average gate error of 1.1+/-0.3% and a simple exponential dependence of fidelity on the number of gates. It shows that the limits on gate fidelity are primarily imposed by qubit decoherence, in agreement with theory.
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