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arXiv 0810.5214cond-mat.mtrl-scicond-mat.mes-hall
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金属-分子界面上分子准粒子能级的重正化:不同结合态的趋势

Renormalization of Molecular Quasiparticle Levels at Metal-Molecule Interfaces: Trends Across Binding Regimes

Kristian S. Thygesen, Angel Rubio

摘要:

当一个电子或一个空穴被加到吸附分子的轨道上时,基底电子将重新排列,以屏蔽所加的电荷。与自由分子的情况相比,这导致电子添加/移除能量的减少。在这项工作中,我们使用一个简单的模型来说明这种重整化机制的微观关键参数的函数的普遍趋势。通过比较GW准粒子能量与Hartree-Fock和Kohn-Sham计算,获得了具有根本和实际重要性的见解。我们确定了两种不同的极化机制:(i)金属的极化(图像电荷形成)和(ii)通过跨界面的电荷转移的分子的极化。发现(i)和(ii)的重要性分别随着费米能级处的金属态密度和金属-分子耦合强度的增加而增加。

英文摘要:

When an electron or a hole is added into an orbital of an adsorbed molecule the substrate electrons will rearrange in order to screen the added charge. This results in a reduction of the electron addition/removal energies as compared to the free molecule case. In this work we use a simple model to illustrate the universal trends of this renormalization mechanism as a function of the microscopic key parameters. Insight of both fundamental and practical importance is obtained by comparing GW quasiparticle energies with Hartree-Fock and Kohn-Sham calculations. We identify two different polarization mechanisms: (i) polarization of the metal (image charge formation) and (ii) polarization of the molecule via charge transfer across the interface. The importance of (i) and (ii) is found to increase with the metal density of states at the Fermi level and metal-molecule coupling strength, respectively.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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