Coherent Diffraction Imaging of Single 95nm Nanowires

英文摘要：

Photonic or electronic confinement effects in nanostructures become significant when one of their dimension is in the 5-300 nm range. Improving their development requires the ability to study their structure - shape, strain field, interdiffusion maps - using novel techniques. We have used coherent diffraction imaging to record the 3-dimensionnal scattered intensity of single silicon nanowires with a lateral size smaller than 100 nm. We show that this intensity can be used to recover the hexagonal shape of the nanowire with a 28nm resolution. The article also discusses limits of the method in terms of radiation damage.