八象限相位掩模电晕放电
An Eight-Octant Phase-Mask Coronagraph
摘要：
我们提出了数值模拟和实验室实验上的八分相位掩模（EOPM）日冕。数值模拟表明，一个可实现的EOPM日冕物质抛射的对比度可以大大提高相比，四象限相位掩模（CAPM）日冕物质抛射的部分解决的明星。天空透过率图表明，EOPM日冕仪具有较高的光通量、较小的内工作角和较大的发现空间。我们已经制造了一个八段相位掩模，利用液晶器件，它可以很容易地切换之间的EOPM和EOPM模式。实验表明，EOPM日冕仪对倾斜误差的容忍度优于COPM日冕仪。我们还讨论了一个完全消色差和高通量的EOPM电晕利用偏振干涉技术的可行性。
英文摘要：
We present numerical simulations and laboratory experiments on an eight-octant phase-mask (EOPM) coronagraph. The numerical simulations suggest that an achievable contrast for the EOPM coronagraph can be greatly improved as compared to that of a four-quadrant phase-mask (FQPM) coronagraph for a partially resolved star. On-sky transmission maps reveal that the EOPM coronagraph has relatively high optical throughput, a small inner working angle and large discovery space. We have manufactured an eight-segment phase mask utilizing a nematic liquid-crystal device, which can be easily switched between the FQPM and the EOPM modes. The laboratory experiments demonstrate that the EOPM coronagraph has a better tolerance of the tip-tilt error than the FQPM one. We also discuss feasibility of a fully achromatic and high-throughput EOPM coronagraph utilizing a polarization interferometric technique.
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