arXiv 0807.45642008-07-29cond-mat.str-elcond-mat.mtrl-sci

Metallic Pattern Fabrication in Organic Mott Insulating Crystal by Local X-Ray Irradiation

Naoki Yoneyama, Takahiko Sasaki, Norio Kobayashi, Yuka Ikemoto, Taro Moriwaki, Hiroaki Kimura

备注：: 3 pages, submitted to APEX
DOI：: 10.1016/j.ssc.2009.02.034

英文摘要：

We have fabricated a metallic structure in an organic Mott insulator $κ$-(BEDT-TTF)$_2$Cu[N(CN)$_2$]Cl. The periodic metallic domains of approximately 90$\times$90 $μ$m$^2$ obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices.

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