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arXiv 0804.4010cond-mat.other
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自旋力矩驱动磁化动力学中的奥斯特场和电流密度分布--实际几何形状的有限元模拟

Oersted fields and current density profiles in spin-torque driven magnetization dynamics -- Finite element modelling of realistic geometries

Riccardo Hertel

摘要:

电流对磁性纳米结构的经典影响进行了分析,在典型的接触几何形状的电流密度分布和奥斯特场的数值计算。对于奥斯特场的计算,混合有限元/边界元法(FEM/BEM)的技术,它可以适用于任意形状的样品。基于有限元/边界元分析,有人认为,可靠的微磁模拟自旋转移扭矩驱动的磁化过程中,应包括精确的奥斯特场的计算,特别是在柱接触几何形状的情况下。同样,有限元模拟表明,需要对电流密度分布进行数值计算,例如,在具有凹口的磁条的情况下。这种条带经常用于基于电流驱动畴壁运动的器件的设计。电流密度的急剧增加被发现在缺口的顶点,这是预计将强烈影响在这样的条的磁化过程。

英文摘要:

The classical impact of electrical currents on magnetic nanostructures is analyzed with numerical calculations of current-density distributions and Oersted fields in typical contact geometries. For the Oersted field calculation, a hybrid finite element / boundary element method (FEM/BEM) technique is presented which can be applied to samples of arbitrary shape. Based on the FEM/BEM analysis, it is argued that reliable micromagnetic simulations on spin-tranfer-torque driven magnetization processes should include precise calculations of the Oersted field, particularly in the case of pillar contact geometries. Similarly, finite-element simulations demonstrate that numerical calculations of current-density distributions are required, e.g., in the case of magnetic strips with an indentation. Such strips are frequently used for the design of devices based on current-driven domain-wall motion. A dramatic increase of the current density is found at the apex of the notch, which is expected to strongly affect the magnetization processes in such strips.

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